Facilities

Growth

Our advanced Molecular Beam Epitaxy system capable of growing materials with atomic layer precision. Using this setup we can achieve epitaxial growth of complex oxides, topological insulators, and other novel materials.

In addition to our MBE system, our lab is equipped with a custom built sputtering chamber. It provides variable temperature ion milling and DC/RF sputtering capabilities.

Characterization & Fabrication

Superconducting Magnet

Electromagnet

Micro-Probe Station

Optical Microscopy Station

Optical & E-beam Lithography systems in Rutgers Physics Nanofab used to fabricate nano-scale devices from our samples

The Thermal Evaporator, E-beam Evaporator, and Sputtering chamber are used as additional methods of thin film deposition.