Facilities: Difference between revisions
Jump to navigation
Jump to search
(→Growth) |
|||
| Line 1: | Line 1: | ||
== Growth == | == Growth == | ||
[[File:MBE-2017-2.jpg|frame|center|Our advanced Molecular Beam Epitaxy system capable of growing materials with atomic layer precision. Using this setup we can achieve epitaxial growth of complex oxides, topological insulators, and other novel materials.]] | [[File:MBE-2017-2.jpg|frame|center|Our advanced hybrid Molecular Beam Epitaxy system capable of growing materials with atomic layer precision. Using this setup we can achieve epitaxial growth of various quantum hybrid structures including complex oxides, topological insulators, and other novel materials.]] | ||
[[File:ion.jpg|frame|center| | [[File:ion.jpg|frame|center|Our lab is also equipped with a custom built sputtering/ion-milling chamber. It provides variable temperature ion milling and DC/RF sputtering capabilities.]] | ||
== Characterization & Fabrication == | == Characterization & Fabrication == | ||
Revision as of 11:02, 20 May 2022
Growth
Our advanced hybrid Molecular Beam Epitaxy system capable of growing materials with atomic layer precision. Using this setup we can achieve epitaxial growth of various quantum hybrid structures including complex oxides, topological insulators, and other novel materials.
Our lab is also equipped with a custom built sputtering/ion-milling chamber. It provides variable temperature ion milling and DC/RF sputtering capabilities.
Characterization & Fabrication
Superconducting Magnet
Electromagnet
Micro-Probe Station
Optical Microscopy Station
Optical & E-beam Lithography systems in Rutgers Physics Nanofab used to fabricate nano-scale devices from our samples
The Thermal Evaporator, E-beam Evaporator, and Sputtering chamber are used as additional methods of thin film deposition.