Facilities: Difference between revisions
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== Growth == | == Growth == | ||
[[File:MBE-2017-2.jpg|frame|center|Our advanced Molecular Beam Epitaxy system capable of growing materials with atomic layer precision. Using this setup we can achieve epitaxial growth of complex oxides, topological insulators, and other novel materials.]] | [[File:MBE-2017-2.jpg|frame|center|Our advanced hybrid Molecular Beam Epitaxy system capable of growing materials with atomic layer precision. Using this setup we can achieve epitaxial growth of various quantum hybrid structures including complex oxides, topological insulators, and other novel materials.]] | ||
[[File:ion.jpg|frame|center| | [[File:ion.jpg|frame|center|Our lab is also equipped with a custom built sputtering/ion-milling chamber. It provides variable temperature ion milling and DC/RF sputtering capabilities.]] | ||
== Characterization & Fabrication == | == Characterization & Fabrication == | ||
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[[File:emagnet2.jpg|frame|center|Electromagnet]] | [[File:emagnet2.jpg|frame|center|Electromagnet]] | ||
[[File:AFM.jpg|frame|center|Atomic Force Microscope capable of standard AFM, Conducting AFM, Piezo-Force microscopy, Kelvin-probe microscopy]] | |||
[[File:furnace1.jpg|frame|center|High Pressure Oxygen/Argon Furnace]] | |||
[[File:furnace3.jpg|frame|center|Oxygen/Hydrogen Furnace]] | |||
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[[File:Img14.jpg|frame|center|Optical & E-beam Lithography systems | [[File:Img14.jpg|frame|center|Optical & E-beam Lithography systems for fabricating nano/micro-scale devices]] | ||
[[File:img3.jpg|frame|center| | [[File:img3.jpg|frame|center|Thermal Evaporator, E-beam Evaporator, and Sputtering chamber for device fabrication]] | ||
Latest revision as of 15:40, 20 May 2022
Growth
Our advanced hybrid Molecular Beam Epitaxy system capable of growing materials with atomic layer precision. Using this setup we can achieve epitaxial growth of various quantum hybrid structures including complex oxides, topological insulators, and other novel materials.
Our lab is also equipped with a custom built sputtering/ion-milling chamber. It provides variable temperature ion milling and DC/RF sputtering capabilities.
Characterization & Fabrication
Superconducting Magnet
Electromagnet
Atomic Force Microscope capable of standard AFM, Conducting AFM, Piezo-Force microscopy, Kelvin-probe microscopy
High Pressure Oxygen/Argon Furnace
Oxygen/Hydrogen Furnace
Micro-Probe Station
Optical Microscopy Station
Optical & E-beam Lithography systems for fabricating nano/micro-scale devices
Thermal Evaporator, E-beam Evaporator, and Sputtering chamber for device fabrication